晶界氧化

leomet · 发表于 2010-7-22 21:33:03

本帖最后由 leomet 于 2010-7-22 21:54 编辑

我很少接觸滲碳, 需請教這方面的專家们:

這個晶界氧化, 皮下~ 100 μm, 嚴重嗎?

材料: AISI 8620

交流为主 · 发表于 2010-7-22 21:54:44

这个应该算比较严重的吧，况且这么深

metart · 发表于 2010-7-23 01:05:52

See AGMA 923-B05, Table 2 as a guideline. The allowable IGO (intergranular oxidation) depth is dependent on the specified case depth. The highest allowed is 60μm for 3mm case depth. Yours appears to be pretty bad, but it all depends on what case depth you're working to.

ISO 6336-5(2003), Table 5 also has similar requirement.

IGO is always checked in the as-polished condition

leomet · 发表于 2010-7-23 09:17:12

回复 3# metart

Thanks ! Buddy.

metart · 发表于 2010-7-23 21:31:58

Here's a typical IGO depth for a carburized AISI 4820 with 2.3-2.5 mm case depth.

sunyinlin · 发表于 2010-7-24 16:20:15

需要看渗碳层深度，如果深度在1mm以内，这样的晶间氧化肯定不合格。

leomet · 发表于 2010-7-24 17:47:25

本帖最后由 leomet 于 2010-7-24 18:01 编辑

Cracking induced by Intergranular Oxidation

photo ~717: observed directly on the end surface after it was polished, etched and lightly polished again.

Raw material is pretty good to my trained eyes. No any other defect was found except this grainboundary oxidation.

leomet · 发表于 2010-7-25 16:18:03

回复 7# leomet
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